It depends on which technology you are working on. 45nm & below there are orientation requirements by foundry. Poly orientation should be same throughout the chip. So Macro poly orientation should match with the poly orientation of the standard cells.
Then the LEF file indicate with the "SYMMETRY" key word, which it is allow "X" or "Y", flipping and "R90" for rotation.
Also as exemple, as indicate by yadavvsli, the flash instance provided by TSMC in 0.18um, if multiple instances are needed, all must be with the same orientation.