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Deep Submicron Layout Guideline

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ccw27

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Hi,

Why use 2 or more column diffusion contact instead of 1 in deep submicron, i.e. <0.15um process? I was told it reduces LOD effect and Vt mismatch. What is LOD effect? Also I was told to use dummy poly to improve mismatch and LOD effect.

Anyone has any other layout recommendation for deep submicron technology?

Thanks
 

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