cmos fabrication technologies

[raghunaandan]

what is the difference b/w silicide and salicide techniques of mos fabrication ? explain in breif ? :thinker::thinker:

 

[dick_freebird]

Salicide is self-aligned silicide, and hits the gate and S/D
regions. You get lower gate resistance and lose some
issues with LDD vs silicided S/D region control because
the spacer/gate hard mask keeps the silicide where it
belongs.

Silicide to me means it's shot at the S/D through a mask
of its own, or only in the contacts (silicide by subsequent
sinter).

But you can't assume it's not a matter of careless expression
either, not everybody cares about every detail and strictly
speaking, both styles are silicide.