in case of std cell layout what are the differences in 65 & 28nm for drawing poly?

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in case of std cell layout what are the differences in 65 & 28nm for drawing poly?

actually i know the common differences like more DRC, density errors, WPE, LOD effects etc.

But with respect to poly what are the difference? allowed routing direction, poly break, poly jog etc

and also why do we go for poly pitch in 28nm?
 

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