bo_diggz
Newbie level 3
I'm a graduate student embarking on research in the area of analog IC design. My potential topic involves deriving circuit solutions to the problems caused by gate current (direct tunneling) to analog circuits in deep submircon CMOS technologies.
I have a few questions to the designers out there. How often is analog design done in deep submicron CMOS technologies (65 nm, 90 nm) where gate current is significant? If it is done, do you avoid thin-oxide devices because of gate current? If so, do you use thick-oxide devices instead? Would analog circuit techniques to deal with problems caused by gate current be of any use to you?
Please let me know what you think. Thanks for your help.
I have a few questions to the designers out there. How often is analog design done in deep submicron CMOS technologies (65 nm, 90 nm) where gate current is significant? If it is done, do you avoid thin-oxide devices because of gate current? If so, do you use thick-oxide devices instead? Would analog circuit techniques to deal with problems caused by gate current be of any use to you?
Please let me know what you think. Thanks for your help.