i am choosing design parameter for 45 nm technology NMOS transistor that is a part of interconnect buffer
in ptm model http://ptm.asu.edu/cgi-bin/test/nanocmos.cgi
the suggested values for transistor width is 17.5 nm
In your first link it is suggesting 17.5nm Leff which is EFFECTIVE length, not drawn length. You normally design by specifying drawn length. The effective length for a given drawn length will be determined by your technology.