ktx2222
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Hi everyone,
I would like to ask a question about fabrication technique: what is the difference between standard MOSFET and RF MOSFET? I also looked at a thread in our forum:
https://www.edaboard.com/threads/59398/
However, I cannot fully understand. So I make new thread.
In 1st pdk which supports RF devices, RF MOS layout has body contacts surrounded the MOS (for both with/without deep N-well versions) and the layout clearly shows where is drain/source terminal. While the standard MOS does not. So I think it may have different doping technique between RF MOS and standard MOS?
And if those MOS are used the same doping technique, in 2nd pdk (which does not support RF devices), can I put body contacts surrounding standard MOS (very similar to layout of RF MOS in 1st pdk) for my RF circuit?
Please help me. Thank in advanced.
I would like to ask a question about fabrication technique: what is the difference between standard MOSFET and RF MOSFET? I also looked at a thread in our forum:
https://www.edaboard.com/threads/59398/
However, I cannot fully understand. So I make new thread.
In 1st pdk which supports RF devices, RF MOS layout has body contacts surrounded the MOS (for both with/without deep N-well versions) and the layout clearly shows where is drain/source terminal. While the standard MOS does not. So I think it may have different doping technique between RF MOS and standard MOS?
And if those MOS are used the same doping technique, in 2nd pdk (which does not support RF devices), can I put body contacts surrounding standard MOS (very similar to layout of RF MOS in 1st pdk) for my RF circuit?
Please help me. Thank in advanced.