Find here published corresponding values for a 250nm process. Even if these values are derived from a pure bulk CMOS process, they won't be far from those of a BiCMOS process.
Find here published corresponding values for a 250nm process. Even if these values are derived from a pure bulk CMOS process, they won't be far from those of a BiCMOS process.
Possibly, but I can't imagine why they'd use it in this context.
In Level 1 MOS models LAMBDA was the CLM coefficient (1/Early_voltage), but as CLM calculation has become much more complex, a lot more parameters had to be used for the calculation of CLM and similar effects on Vth & IDS, like velocity saturation, VFMR & DIBL. In BSIM4 (Level 49 & 54) models the LAMBDA parameter has quite a different meaning (velocity overshoot coefficient).
You'd better ask MOSIS themselves for the LAMBDA meaning.
In this MOSIS document lambda "SCN5M_DEEP (lambda=0.12) ... SCN6M_SUBM (lambda=0.15)" refers to something like design grid, it's in micrometers and there is no relation to "lambda" as channel length modulation effect.
For this BSIM3 model, channel-length modulation coefficient should be PCLM parameter.
To be honest, I don't know exact relationship of PCLM coef to basic mosfet equation lambda param. You should do research in bsim3 docs for more detailed eplanation: **broken link removed**
During studies I made lambda parameter extraction from bsim3 model, I believe you can find some instructions for extraction with googles
PCLM is only one of several parameters used for CLM calculation, s. this page from the BSIM4v4.7 MOSFET Model User Manual : View attachment BSIM470_Manual_p41.pdf