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Hi,
Ion implantation is used to imlant impurity into intrinsic semiconductor.
That is you can say it is used for substrate and well formation.
Also it is prefrred over diffusion because of its accuracy.
For more details go through the book by Allen Hollberg
Ion implantation is used to imlant impurity into intrinsic semiconductor.
in dis method intrinsic semiconductor is bombard wid ions of elements which are r to be used as dopent.
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