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Different VT's used in characterization

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Subhashy

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Hi,
Why we use different VT's(LVT,SVT,HVT) in characterization to measure slews.And these measured slews will be used for all VT's in characterization. Why don't we use same VT to calculate slews?
 

Hi,
Why we use different VT's(LVT,SVT,HVT) in characterization to measure slews.And these measured slews will be used for all VT's in characterization. Why don't we use same VT to calculate slews?

Confusing questions.

The simple answer is different VTs change the doping that will change the performance. That has to be captured.

Now, characterisation uses a range of slopes. These represent all possible scenarios a cell might encounter when placed with other cells -- some really fast slopes and some not as much. The perforamance of the cell changes drastically according to how fast its inputs are transitioning.
 

If you're referring to characterizing (say) logic gates made
with low threshold, standard threshold and high threshold
transistors (as serve speed-critical, "regular" and low leakage
purposes respectively), each gate needs an accurate timing
model and a gate made with a different VT implant-pair will
show very different performance. Slew rate being only one
of the attributes of interest.

You are after realism and construction differences are a
real thing.
 

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