which has more resistance, contact or via ?

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For nonsilicide technologies resistance of via will be much less than contact (for the comparable sizes). Resistance of contact depends not only on the geometrical sizes, but also from doping degree of material to which contact is done.
For technologies with silicide the difference of resistance will be determined as a rule by a ratio of the geometrical sizes, therefore resistance of contact will be higher in 1.5 - 2 times than via for usual metal layers and in 4 - 6 times for thick metal layers.
 

santhosh.mandugula said:
which has more resistance, contact or via ?
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Should be contact
but it is necessary
 

contact resistance is much more compared to the vias as the contact is mixture of the semiconductor and metal where as the vias is just mixture of teh metals.
salicid is a special layer cquoting to reduce the resistance.
 

As you go up in the structure, the resistances are geting smaller and smaller, so contacts have the greatest resistance, usual 3-4 time that VIA1
 

I agree contance has a much higher resistance.
 

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