subbareddy434
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i have designed differential ring oscillator using replica bias load
my specifications are differential swing 0.4v ,ISS=200uA vdd=1.8v load resistance =2k
Technology used 180nm UMC
i used four stage ring vco.my problem is when sweep a control voltage i am getting linear chracterisitics in small region only.after that by increasing control voltage makes pmos device goes into saturation(actually it should be in linear region i.e resistor) That causes swing to change...
here i am attaching my schematic and transfer curve
my specifications are differential swing 0.4v ,ISS=200uA vdd=1.8v load resistance =2k
Technology used 180nm UMC
i used four stage ring vco.my problem is when sweep a control voltage i am getting linear chracterisitics in small region only.after that by increasing control voltage makes pmos device goes into saturation(actually it should be in linear region i.e resistor) That causes swing to change...
here i am attaching my schematic and transfer curve
