IC fabrication during the 1960s to 1970s

[MitchElectronics]

Hi all,

I have spent some time now (at least a month), trying to find out how chips where fabricated from the 60's and 70's. I know all of the steps including lithography to layer removal etc but what I cant find is the type of equipment they used to expose the silicon. Is there any documentation that explains in great detail how these devices where manufactured?

What I really want to know is what light source they used, their mask size and how they projected an image down?

Many thanks all!
Robin

 

[erikl]

Then optical shadow printing was used, either by contact printing or proximity printing. Light sources were Xenon or Mercury short-arc UV lamps. The exposure tools were manually controlled (later automatic) steppers, using step-and-repeat projection, either 1:1 , or with 4:1 .. 10:1 demagnification masks.

You might find some answers in the book Fundamentals of Semiconductor Manufacturing and Process Control by May & Spanos, chap. 2.1.2.1. Exposure Tools , pp. 35 ff.

Still available tools you can find e.g. here: mask aligners, exposure tools, and remanufactured equipment, partly with pictures.

 

[MitchElectronics]

erikl,

Thanks. So. Much. No really. Thanks!

Robin