Nov 7, 2005 #1 E earnie Newbie level 3 Joined Oct 17, 2005 Messages 4 Helped 0 Reputation 0 Reaction score 0 Trophy points 1,281 Activity points 1,303 Given an electron beam lithography system and a focused ion milling system, both with a normal beam size of 30nm. Which technique would produce smaller feature? Are both the same? Why and why not??
Given an electron beam lithography system and a focused ion milling system, both with a normal beam size of 30nm. Which technique would produce smaller feature? Are both the same? Why and why not??