Feb 19, 2013 #1 Y Yathin P U Junior Member level 3 Joined Oct 11, 2012 Messages 27 Helped 0 Reputation 0 Reaction score 0 Trophy points 1,281 Activity points 1,447 What are the challenges faced as we move from higher to lower technologies in layout perspective (for example 180nm -> 90nm ->45nm etc)
What are the challenges faced as we move from higher to lower technologies in layout perspective (for example 180nm -> 90nm ->45nm etc)
Feb 19, 2013 #2 J Junus2012 Advanced Member level 5 Joined Jan 9, 2012 Messages 1,552 Helped 47 Reputation 98 Reaction score 53 Trophy points 1,328 Location Italy Activity points 15,235 Dear the most challenge is the matching in the layout of the small technology. the higher geometry devices leads to have better matching.
Dear the most challenge is the matching in the layout of the small technology. the higher geometry devices leads to have better matching.
Feb 21, 2013 #3 P putturvenkatesh Newbie level 4 Joined Oct 3, 2010 Messages 6 Helped 1 Reputation 2 Reaction score 1 Trophy points 1,283 Location Hubli Activity points 1,317 Common challenges are: 1. LOD 2. WPE 3. DFM 4. Diffusion proximity effects 5. Optical proximity correction related rules 6. DIBL 7. Hot electron effect etc.. For each topic you will get materials if you search in Google. Let me know if you need any help with searching. Regards, Venky
Common challenges are: 1. LOD 2. WPE 3. DFM 4. Diffusion proximity effects 5. Optical proximity correction related rules 6. DIBL 7. Hot electron effect etc.. For each topic you will get materials if you search in Google. Let me know if you need any help with searching. Regards, Venky
Feb 27, 2013 #4 Y Yathin P U Junior Member level 3 Joined Oct 11, 2012 Messages 27 Helped 0 Reputation 0 Reaction score 0 Trophy points 1,281 Activity points 1,447 thank you for your reply