hk2004
Member level 2
I am working on the trimming bandgap reference design, the target performance is 30ppm.
Some questions need help from experienced designer, thanks so much.
1. Generally fomular for Vref output, Vref= (R2/R1) * (lnN) + VBE. Someone mentioned that adjusting R1 to trimming TC, the reason behind your statement is that, changing R1--> Changing IPTAT-->same as changing IC of VBE--> Changing the VBE TC, am I right?
2. Then trimming the R2 to adjust level of Vref. My quesion is: Can I trim R2 only, both Vref value and TC are trimmed if I adjust the R2 according the Verf= (R2/R1) * (lnN) + VBE. Many open literature reported this method. Actually, trimming R2, both the slope and level are adjusted. I am confusing about the trimming.
3. trimming R1 or R2 or R1+R2 is to trim the bandgap reference first order only. Based on your experience, for CMOS process with parasitic PNP BJT for BGR design, can first order trimming circuit achieve less than 30ppm performace for mass production? Based on the results disclosed in some patents, the curvature(second and third order) triming achieves less than 3ppm improvement compared to first order triming. Over third order curvature trimming is futile for mass production. In industry,does the commercial products desing adopt curvature triming(second even third trimming)? If yes, what's its tempco after curvature trim in mass production?
4. For low power BGR design(total current assumption less than 90uA), how much is the offset of the error amplifier? This offset is need to calcualte trimming range. Is 10mv offset value reasonable?
5. This quesion is related to trimming procedure in mass production. Considering the packaged related mechnical press causes tempco drift, the trimming should be done after chip is packaged. My understanding of the trimming procedure in mass production is listed below. Kindly please comment.
Before the packaged chip is trimmed, I need to know its Vref output curve(If I do not know its cure, How do I trim it, right?). In order to know verf Curve, I have to measure the Vref output at least three temperature point(two extreme temperature plus mid-temp) . After I know the vref curve, if it meet the spec, then no trim. if not meet the spec, I trim it into specified range. But .. . so many measurements need to be done. three times measurement in different temperature for curve, then trim it. Is it accetable for mass production considering the time-cost?
Another quesion is ... If I know the Vref curve, how many temperature points need to be trimmed? two points? (two points defining the slope of the curve)
So many questions, thanks in advanvace.
Some questions need help from experienced designer, thanks so much.
1. Generally fomular for Vref output, Vref= (R2/R1) * (lnN) + VBE. Someone mentioned that adjusting R1 to trimming TC, the reason behind your statement is that, changing R1--> Changing IPTAT-->same as changing IC of VBE--> Changing the VBE TC, am I right?
2. Then trimming the R2 to adjust level of Vref. My quesion is: Can I trim R2 only, both Vref value and TC are trimmed if I adjust the R2 according the Verf= (R2/R1) * (lnN) + VBE. Many open literature reported this method. Actually, trimming R2, both the slope and level are adjusted. I am confusing about the trimming.
3. trimming R1 or R2 or R1+R2 is to trim the bandgap reference first order only. Based on your experience, for CMOS process with parasitic PNP BJT for BGR design, can first order trimming circuit achieve less than 30ppm performace for mass production? Based on the results disclosed in some patents, the curvature(second and third order) triming achieves less than 3ppm improvement compared to first order triming. Over third order curvature trimming is futile for mass production. In industry,does the commercial products desing adopt curvature triming(second even third trimming)? If yes, what's its tempco after curvature trim in mass production?
4. For low power BGR design(total current assumption less than 90uA), how much is the offset of the error amplifier? This offset is need to calcualte trimming range. Is 10mv offset value reasonable?
5. This quesion is related to trimming procedure in mass production. Considering the packaged related mechnical press causes tempco drift, the trimming should be done after chip is packaged. My understanding of the trimming procedure in mass production is listed below. Kindly please comment.
Before the packaged chip is trimmed, I need to know its Vref output curve(If I do not know its cure, How do I trim it, right?). In order to know verf Curve, I have to measure the Vref output at least three temperature point(two extreme temperature plus mid-temp) . After I know the vref curve, if it meet the spec, then no trim. if not meet the spec, I trim it into specified range. But .. . so many measurements need to be done. three times measurement in different temperature for curve, then trim it. Is it accetable for mass production considering the time-cost?
Another quesion is ... If I know the Vref curve, how many temperature points need to be trimmed? two points? (two points defining the slope of the curve)
So many questions, thanks in advanvace.