sudeeps
Newbie level 5

Hello Friends,
Have some generic query on 28nm and lower technology nodes. Can someone point me to some reference material or explain the following layout dependent effects which are supposed to be more critical in lower technology nodes :
1. LOD
2. OSE ( OD spacing effect )
3. PSE ( Poly spacing effect )
How are these checked in DRC and what are the fix recommended ?
Need some urgent guidance on these.
Thanks
Have some generic query on 28nm and lower technology nodes. Can someone point me to some reference material or explain the following layout dependent effects which are supposed to be more critical in lower technology nodes :
1. LOD
2. OSE ( OD spacing effect )
3. PSE ( Poly spacing effect )
How are these checked in DRC and what are the fix recommended ?
Need some urgent guidance on these.
Thanks