Michele.A
Newbie level 6
Hi everybody,
here's my question: in a former (BiCMOS) process I've been designing with, I used to size resistors and (especially) MOS devices also based on matching parameters, namely using a
\[\sigma = \frac{\sigma_A}{Area}\]
type of expression to evaluate the needed area in order to stay under a target spread. I could retrieve this information from the Design Rule Manual.
Now, I have changed Company and technology
Also the fab providing the tech node - now TSMC - is new to me (strange as it may sound 8-O)
That is to say that maybe things are organized differently...But I am expecting to find some equivalent information also for the two nodes I am looking into right now, namely 180nm and 65nm CMOS. Of course I am forwarding this same topic to my fellows inside my Company, but I'd nevertheless like to gather some experience from you.
Is it customary in TSMC processes to have these \[\sigma\] written somewhere for process parameters like \[V_T\] ,\[ \frac{\Delta{L}}{L}\] , ...
or it is a somewhat obsolete/unapplicable concept? I'd really like to avoid resorting to MC runs to get this type of information...
Thanks for any suggestion,
Michele
here's my question: in a former (BiCMOS) process I've been designing with, I used to size resistors and (especially) MOS devices also based on matching parameters, namely using a
\[\sigma = \frac{\sigma_A}{Area}\]
type of expression to evaluate the needed area in order to stay under a target spread. I could retrieve this information from the Design Rule Manual.
Now, I have changed Company and technology
Also the fab providing the tech node - now TSMC - is new to me (strange as it may sound 8-O)
That is to say that maybe things are organized differently...But I am expecting to find some equivalent information also for the two nodes I am looking into right now, namely 180nm and 65nm CMOS. Of course I am forwarding this same topic to my fellows inside my Company, but I'd nevertheless like to gather some experience from you.
Is it customary in TSMC processes to have these \[\sigma\] written somewhere for process parameters like \[V_T\] ,\[ \frac{\Delta{L}}{L}\] , ...
or it is a somewhat obsolete/unapplicable concept? I'd really like to avoid resorting to MC runs to get this type of information...
Thanks for any suggestion,
Michele