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many thanks for your reply, i will try to clarify my question, i am using an abstract model for T.L, where the fare and near voltage of the transmission line is Vwin and Vwout, the near and far cureents are Iwin and I rec,
the equations provided are
Vwout= Vwin-Iwin Z0
where Z0 is the...
Hi,
i am trying to design a lossy transmission line with characteristic impedance Z0
i choose the RC distributed model
i found that Z0=sqrt(R/wC)
where Rand c are the interconnect resistance and capacitance per unit length.
how i determine the required wire length? and number of RC...
Hi
i am working on design nmos current driver
using the equations
Idsat= Wg/2Lg (µnCox(VGS – Vth))^2
VDsat=VGS-vth
if VDD=1 v
vth=0.18
what is an appropriate value for VGS to drive the wire with low voltage swing?
Hi every body:-)
i am trying to design a simple current sensing interconnect , composed of a driver with current Iwin , lossy transmission line with impedance Z0, near and far- end voltage vwin, vout and receiver with termination resistance Rt nad received current Irec, i have 3 simple...
i am choosing design parameter for 45 nm technology NMOS transistor that is a part of interconnect buffer
in ptm model
http://ptm.asu.edu/cgi-bin/test/nanocmos.cgi
the suggested values for transistor width is 17.5 nm
for NangateOpenCellLibrary
http://www.eda.ncsu.edu/wiki/FreePDK45:Contents...
Hi every one,
again i am working on 45 nm technology when ITRS reports estimates 40% threshold voltage variability
it also mention that the threshold voltage variation reaches 30 % of supply voltage
for VDD = 1volt
threshold voltage variation will be 30 mv
PTM technology model mention vth = 180...
hello every body
i am using open cell library for 45 nm technology
i am trying to get technology information for semi global metal layer
the lef file contain 8 metal layers, i do not know which layer is considered semi global?
also if i used metal 5 layer as an example i found
LAYER metal5...
hi every one
i calculate the interconnect resistance by unit length for 45 nm technology
by the equation
Rinterconnect = Resistivity/(Thickness * Width)
i am using Metal Resistivity value 1.688e-2 ohm.micro meter
Thickness = 0.280 micro meter
Width =140 micrometer
i got R interconnect 0.0004...
Hi every one,
again i am working on 45 nm technology when ITRS reports estimates 40% threshold voltage variability
it also mention that the threshold voltage variation reaches 30 % of supply voltage
for VDD = 1volt
threshold voltage variation will be 30 mv
PTM technology model mention vth = 180...
thanks for your help
i have another questions
i calculate the interconnect resistance by unit length for 45 nm technology
by the equation
Rinterconnect = Resistivity/(Thickness * Width)
i am using Metal Resistivity value 1.688e-2 ohm.micro meter
Thickness = 0.280 micro meter
Width =140...
thanks for your help :-D
i have another questions
i calculate the interconnect resistance by unit length for 45 nm technology
by the equation
Rinterconnect = Resistivity/(Thickness * Width)
i am using Metal Resistivity value 1.688e-2 ohm.micro meter
Thickness = 0.280 micro meter
Width =140...
for nmos transistor
the on resistance Ron is given by the equation
Rtransistor =Lg0/(Width* mu *COX*(VDD-VT0))
i use the following values
Lg0 17.5 nm -> .0175 micro meter
width 140 micro meter
this make w/l =8000 which i think very reasonable
VDD 1 volt
VT0 0.18 volt
from my model i found...
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