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Why is LDMOS transistors p-base formed by lateral diffusion

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wilkinson

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about LDMOS

Hi, all

why is the p-base in the LDMOS transistor formed by lateral diffusion of a p-type implantation, but not vertical. Thanks
 

about LDMOS

if by vertical, how to get the S and D with metal?
And the vertical in only for discrete device DMOS
 

Re: about LDMOS

Just for joking, if LDMOS (lateral diffusion MOS) had vertical diffusions, they'll be called VDMOS;-)

As sunkin said, the D region must be contacted someway. If the diffusion would be vertical, somewhere it has to bend up in order to be copntacted at the Si surface. Remember: CMOS is a plannar technology. It is always easier to make 2D (with some depth evidently) structures than to do them in 3D. Also keep in mind that most of CMOS wafer are just a bulk of Si. If you want to make 3D structures you should have some epi layers or something similar.
 

Re: about LDMOS

Vertical DMOS in IC technology forms with buried layer, that is main current flows through base in vertical direction, then by means of buried layer current flows horizontal into drain.

In horizontal DMOS the resistance of bulk into vertical direction too large and
main current flows in horizontal direction.
 

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