cqmyg5
Advanced Member level 4
In TSMC process, "P implant" layer and "AA" layer are used together to define a PMOS, and only "AA" is used to define a NMOS.
:?: what's the purpose to use two layers to realize a active area???
:?: why couldn't only use one layer, for example "Pdiff", to define PMOS and "Ndiff" to define NMOS's active area???
:?: why PMOS and NMOS use the same "AA" layer???
Thanks!!!
:?: what's the purpose to use two layers to realize a active area???
:?: why couldn't only use one layer, for example "Pdiff", to define PMOS and "Ndiff" to define NMOS's active area???
:?: why PMOS and NMOS use the same "AA" layer???
Thanks!!!