melkord
Full Member level 3
I recently read about MEBES, but from the description, it seems similar with the description of mechanical-optical pattern generator.
both are related with lithography mask preparation and fabrication.
But I am not quite sure whether they are the same or not.
What I know about mechanical-optical pattern generator:
it is an exposure machine that exposes the photoresist on blank mask. it expose multiple smaller parts of layout that form the final complete layout.
Maybe someone can explain about it a bit.
both are related with lithography mask preparation and fabrication.
But I am not quite sure whether they are the same or not.
What I know about mechanical-optical pattern generator:
it is an exposure machine that exposes the photoresist on blank mask. it expose multiple smaller parts of layout that form the final complete layout.
Maybe someone can explain about it a bit.
