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How to calculate Argon ion and electron energy using in Sputtering process

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ent_ee39

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Hi all,
I have just begun to study about DC micro sputtering which is performed in SEM (scanning electron microscope) chamber.
I would like to ask anyone that if I want to know Argon ion and electron energy using in Sputtering process, how can I know them ?

For my experimental set up:
I use DC power supply to generate plasma.
Anode is orifice which is used for feeding Ar gas between two electrodes.
Cathode is silicon substrate.
When I operate the experiment, electron beam of SEM machine is on.
I use accelerated voltage = 5 KeV.

Could you please suggest me about this?

Thanks in advance,
Ent
 

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