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hi
As the tech node goes on decreasing your rules keep on increasing
We use poly in only one orientation
We maintaion poly -poly pitch which is constant
We use end caps OR fillers at the end of every row below 45nm
Hi
I have a scenario where i have some changes made to GDS and want to revert back to def. Is it possible ? I have netlist with me.
Scenario:
I have solved some DRC on M8 layer and some other person has solved some DRC on M2 layer. Now we want to merge those...
Hi
i do not understand how people arrived at the value that skew should be 20% of clock period. Could you please answer each question with number in detail. I would be so grateful to you
1. Also one more doubt does the area of the design influence the insertion delay ???
2...
thanks i opened the layout and i find the same. CPO is contact for poly right ?? poly is connected to VSS in this so it forms a gate type decap where the upper plate is POLY and lower is lower is BULK. am i right ??
Hi what is seal ring ? what is SR_DPO ? how is it different from normal PO.
i saw a filler cell layout and i find DPO running over OD with its source and drain unconnected.
Can we have such unconnnected transistors???
Please help me out of this confusion
So you say that it forms an extra npn transistor which is unintended right? Thats the reason we give spacign and one more is the manufacturability thing.
Thanks for the answer dick
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