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I only have a 5v supply , and I need generate the 3.3v supply to drive the
the digital cicuit working at the frequency 100k, the max current is 5mA
for all the Precess , temp(-40~125), volatage(4.5~5.5). I need the 3.3v output
varies within 10%.
the question is: I have to use a 130nm TSMC...
hi guys,
recently I meet a very big issue.
when I design the charge pump in PLL, usually we need a
source follower to reduce the current mismatch.
And people often design the bandwidth of OP over PFD frequency.
But at this time we can not make it.
So what I want to know is whether the...
thanks for your help.
I know the Av=3mV*1u.
one more thing I want to know is how much difference of
offset between your estimation and test results?
or your simulation in monte carlo and test results.
hi folks,
recently I'm designing a circuit which need a very accurate comparator.
the resolution must be smaller than 1mv.
also the offset has to be less than 2-3mv(3 sigma).
the process is tsmc13 logic. the area of it should be within 30umx30um
speed is not very critical, 30ns for...
Re: what's the trend of vth when width or length goes smalle
yes, I use hspice to check that. and almost all process include
tsmc 13 18, behave like that.
And vds=0. vg=0 or vdd the trend is almost the same.
I think the ldd effects is one factor of that.
but what's the meaning of FOX effects...
hi guys,
I'm so confused that when i sweep the width or length of transistors and probe the
vth of them. the trendency is when length goes smaller vth goes high. and when
width goes larger vth goes high.
all of these is directly different from text book. why?
the source and drain are not the same, in modern process.
the foundary usually do LDD in source and drain, so the plasma is not
absolut vertical. although they shift the wafer around to make the source and
drain doping similar, they are still different.
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