Continue to Site

Welcome to EDAboard.com

Welcome to our site! EDAboard.com is an international Electronics Discussion Forum focused on EDA software, circuits, schematics, books, theory, papers, asic, pld, 8051, DSP, Network, RF, Analog Design, PCB, Service Manuals... and a whole lot more! To participate you need to register. Registration is free. Click here to register now.

Register Log in

Poly & Active corner distance to gate distance relaxed

Status
Not open for further replies.
gafsos

gafsos

Full Member level 3
Joined
Feb 1, 2006
Messages
189
Helped
25
Reputation
50
Reaction score
11
Trophy points
1,298
Location
North Africa
Activity points
2,450
Hello,

Who can Please explain to me this DFM (Design for Manufactring) Rule ?

Poly & Active corner distance to gate distance relaxed

Thanks
 

Its active gate area space to the enclosing base layer. Has been reducing with new technology nodes...45nm to 28nm its reduced by 30% i think.
 
  • Like
Reactions: gafsos

    gafsos

    gafsos

    Points: 2
    Helpful Answer Positive Rating
Status
Not open for further replies.

Similar threads

Part and Inventory Search

Welcome to EDABoard.com

Sponsor

Back
Top