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Ion Implantation in vlsi technology

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vead

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Q1what is Ion Implantation in vlsi technology?
Q2what type of Impurity are added into silicon
substrate?
 

Ion implantation is a materials engineering process by which ions of a material are accelerated in an electrical field and impacted into a solid. This process is used to change the physical, chemical, or electrical properties of the solid. Ion implantation is used in semiconductor device fabrication and in metal finishing, as well as various applications in materials science research.

Commonly used dopant are boron, phosphorus or arsenic.
https://en.wikipedia.org/wiki/Ion_implantation
 

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