hrkhari
Full Member level 4
Hi Guys:
I had laid out a pMOS transistor with grounded dummies poly (gate) as etch guards to reduce mismatch. With reference to the attached figure, I had connected the dummies using metal in a loop surrounding the pMOS transistor. I had read that placing dummy in a continuous ring poly could induce electromagnetic field due to dry etching to produce circulating current that could affect etch rates during the final minutes of etching, hence it is important to employ a gap to interrupt the circulating current. My question is, does this type of connection of dummy(as in the attached figure) would experience the same phenomenon?, Do I have to separate the ground of the dummies to a broken loop connection?. Thanks in advance
Rgds
I had laid out a pMOS transistor with grounded dummies poly (gate) as etch guards to reduce mismatch. With reference to the attached figure, I had connected the dummies using metal in a loop surrounding the pMOS transistor. I had read that placing dummy in a continuous ring poly could induce electromagnetic field due to dry etching to produce circulating current that could affect etch rates during the final minutes of etching, hence it is important to employ a gap to interrupt the circulating current. My question is, does this type of connection of dummy(as in the attached figure) would experience the same phenomenon?, Do I have to separate the ground of the dummies to a broken loop connection?. Thanks in advance
Rgds