lucky2005
Newbie level 3
Hi,
I am new to TSMC lib, Could some one please explain me the purpose of the diffusion layer ( is it to define the source/drain regions ?).
What i see is,
For a PMOS, there is NWELL, P-implant (for source/drain region), N-implant (for the bulk region) also there is OD(diffusion) layer from where the source and drain connections are taken out through metal.
similarly, for NMOS, there is N-implant(for source/drain region), P-implant (for the bulk region) also there is OD(diffusion) layer from where the source and drain connections are taken out through metal.
The only thing unclear here is the purpose of another layer other than the implant which they call the diffusion layer ?
Any help would be appreciated.
Thanks
I am new to TSMC lib, Could some one please explain me the purpose of the diffusion layer ( is it to define the source/drain regions ?).
What i see is,
For a PMOS, there is NWELL, P-implant (for source/drain region), N-implant (for the bulk region) also there is OD(diffusion) layer from where the source and drain connections are taken out through metal.
similarly, for NMOS, there is N-implant(for source/drain region), P-implant (for the bulk region) also there is OD(diffusion) layer from where the source and drain connections are taken out through metal.
The only thing unclear here is the purpose of another layer other than the implant which they call the diffusion layer ?
Any help would be appreciated.
Thanks