naeemmaroof
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I am going through MOSIS and I find two different spice models (BSIM4) for 90nm (hopefully for two different specialized processes).
https://www.mosis.com/cgi-bin/cgiwrap/umosis/swp/params/ibm-90/t96w_9sf_9m_lb_3-params.txt and
https://www.mosis.com/cgi-bin/cgiwrap/umosis/swp/params/ibm-90/v15p_9lprf_9lb-params.txt
these have very different (0.26 and 0.12) VTH0.
The problem I have is that I want to replicate the results of certain paper in which they have used 90nm technology. So which model should I use? These two models are only from IBM. So I hope that other foundry parameters will also be much different from these. I found in PTM 90nm model that VTH0 is about 0.38.
What should I do, because for all these models the results replicated are not same (though W/L values are known)
https://www.mosis.com/cgi-bin/cgiwrap/umosis/swp/params/ibm-90/t96w_9sf_9m_lb_3-params.txt and
https://www.mosis.com/cgi-bin/cgiwrap/umosis/swp/params/ibm-90/v15p_9lprf_9lb-params.txt
these have very different (0.26 and 0.12) VTH0.
The problem I have is that I want to replicate the results of certain paper in which they have used 90nm technology. So which model should I use? These two models are only from IBM. So I hope that other foundry parameters will also be much different from these. I found in PTM 90nm model that VTH0 is about 0.38.
What should I do, because for all these models the results replicated are not same (though W/L values are known)