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These layers correspond to masks used for different process steps, on one hand, and on the other - they correspond to various layers in layout databases (GDSII, etc.).
There is a lot of jargon in layer name definitions, but also some common names.
Active = diffusion = moat - this is "active silicon", i.e. areas outside of isolation (usually STI isolation), where devices are formed (for example, overlap of gate poly and active corresponds to channel area of a MOSFET).
Select - I don't know.
N+ implant - areas where n+ implant is going into (you should know what is N+ and what is implant).
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