Megahed89
Newbie level 3
I am running MC simulations, I want to view the effect of both mismatch and process variations, however, I am not sure how the simulation works, does this mean that each run will be at a different process and devices are mismatched within the same process of that run? or does it mean that devices could be in different process corners within the same run?
I think the first condition is the correct one, I just want to make sure as the pdk documents does not explain well.
I think the first condition is the correct one, I just want to make sure as the pdk documents does not explain well.