melkord
Full Member level 3
"The electrical resistivity of metallic conductors is increased
compared to the bulk resistivity if the diameter of the
wire is in the range of or smaller than the mean free path of
the electrons ~about 40 nm for copper at room temperature!."
from: DOI: 10.1103/PhysRevB.66.075414
My questions:
1. Do EDAs include/recognize the confinement effect in thin(and small) metal tracks during resistance calculation/extraction?
2. If yes, can confinement-effect-included resistance be represented as a sheet resistance which is included in the technology file? because so far what I know/consider/keep in mind during layout making is only the sheet resistance, capacitance, and design rules.
3. What is the smallest metal tracks in advance node, let's say in 7 nm node?
Quantum confinement:
https://en.wikipedia.org/wiki/Potential_well#Quantum_confinement
https://en.wikipedia.org/wiki/Quantum_dot#Quantum_confinement_in_semiconductors
compared to the bulk resistivity if the diameter of the
wire is in the range of or smaller than the mean free path of
the electrons ~about 40 nm for copper at room temperature!."
from: DOI: 10.1103/PhysRevB.66.075414
My questions:
1. Do EDAs include/recognize the confinement effect in thin(and small) metal tracks during resistance calculation/extraction?
2. If yes, can confinement-effect-included resistance be represented as a sheet resistance which is included in the technology file? because so far what I know/consider/keep in mind during layout making is only the sheet resistance, capacitance, and design rules.
3. What is the smallest metal tracks in advance node, let's say in 7 nm node?
Quantum confinement:
https://en.wikipedia.org/wiki/Potential_well#Quantum_confinement
https://en.wikipedia.org/wiki/Quantum_dot#Quantum_confinement_in_semiconductors