+ Post New Thread
Results 1 to 5 of 5
  1. #1
    Newbie level 2
    Points: 19, Level: 1

    Join Date
    Jul 2016
    Posts
    2
    Helped
    0 / 0
    Points
    19
    Level
    1

    IBM 0.13um process BN layer

    Hi,

    Does anyone know what the BN (DEV) layer does in the IBM 0.13um (cmrf8sf) process?

    •   AltAdvertisment

        
       

  2. #2
    Advanced Member level 5
    Points: 38,224, Level: 47

    Join Date
    Mar 2008
    Location
    USA
    Posts
    6,181
    Helped
    1792 / 1792
    Points
    38,224
    Level
    47

    Re: IBM 0.13um process BN layer

    I see nobody responding so I'll suggest that while you're
    waiting, you find a copy of the design kit docs and find
    the mask levels descriptions and groundrules that pertain
    to this layer. That ought to be what anybody who uses
    the process, would be regurgitating on your behalf.



    •   AltAdvertisment

        
       

  3. #3
    Super Moderator
    Points: 51,484, Level: 55
    Achievements:
    7 years registered
    erikl's Avatar
    Join Date
    Sep 2008
    Location
    Germany
    Posts
    8,064
    Helped
    2642 / 2642
    Points
    51,484
    Level
    55

    Re: IBM 0.13um process BN layer

    Quote Originally Posted by droogie View Post
    ... what the BN (DEV) layer does in the IBM 0.13um (cmrf8sf) process?
    Seems you can't get access to these docs - like anybody else who couldn't register with MOSIS (for example) or Big Blue itself.

    As it is DEVice layer, I'd think this is a marking layer for a device, e.g. for a type "B" NMOS transistor (just guessing). If you are trying to "rework" a layout, try and recognize a device structure beneath such a layer marking polygon.



    •   AltAdvertisment

        
       

  4. #4
    Newbie level 2
    Points: 19, Level: 1

    Join Date
    Jul 2016
    Posts
    2
    Helped
    0 / 0
    Points
    19
    Level
    1

    Re: IBM 0.13um process BN layer

    Quote Originally Posted by dick_freebird View Post
    I see nobody responding so I'll suggest that while you're
    waiting, you find a copy of the design kit docs and find
    the mask levels descriptions and groundrules that pertain
    to this layer. That ought to be what anybody who uses
    the process, would be regurgitating on your behalf.
    Thanks for responding..actually I've already gone through the PDK docs, but it's still somewhat unclear to me.

    My objective is to draw an area of active (RX) without any kind of P+ or N+ implant, essentially controlling STI. I read in a paper that BN and BP can be used to control the N+ implant and so was wondering exactly how BN achieves this.

    I understand that:

    (BP^RX) = P+ implant
    RX = N+ implant

    This is what I have a doubt with:

    (BN^RX^(BP')) = ?



  5. #5
    Super Moderator
    Points: 51,484, Level: 55
    Achievements:
    7 years registered
    erikl's Avatar
    Join Date
    Sep 2008
    Location
    Germany
    Posts
    8,064
    Helped
    2642 / 2642
    Points
    51,484
    Level
    55

    Re: IBM 0.13um process BN layer

    if (RX = active area) then (BP^RX) = P+ implant over field oxide (?)
    if (RX = N+ implant) then (BP^RX) = P+ implant ; is correct (but probably not necessary, if BP = P+ implant)

    I think BP' is either an extended BP, or an inverted BP ; should be possible to be found in the DRC rules.



--[[ ]]--