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Thickness metal 1, metal 2 and metal 3 technology AMI 0.5um

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biolycans

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Hi everyone !

I would like to know the thickness (height) of Metal 1, Metal 2 and Metal 3 for the technology AMI 0.5 um with a lambda of 0.3.

I would be very grateful if you can help me !

Best regards !

Joaquín
 

Here's a general compilation of metal thicknesses for several process nodes:

interconnect_thicknesses.gif

Note that for process sizes ≧ 0.35µm upper and lower metal layers used to have the same thickness.
 
Even if somebody had this information directly, they wouldn't be able to tell you because of non-disclosure agreements. Are you working through MOSIS? They might have spice models or better documentation available from which you could estimate the inter-metal thicknesses.

I found this link to MOSIS which has lots of data. With some work, I'd bet you could get some reasonable estimates:
https://www.mosis.com/pages/Technical/Testdata/ami-c5-prm
 
Dear Erikl,

thank you for your response. Can you tell me what values from the last extracted C5 run should I take, for the calculation of the thickness of M1, M2 and M3 ?

I don´t know why you use the value 0.0282. in the file you gave me, each metal has it´s own resistivity.

Regards !

Joaquin
 

Can you tell me what values from the last extracted C5 run should I take

I believe Erikl was looking at the Sheet Resistance. https://en.wikipedia.org/wiki/Sheet_resistance is a good reference here. This is a measure of the resistance of the metal, given a certain thickness. The parameter he gave was the resistivity of the metal layer independent of geometry.

The equation of resistance given in the wiki article was R = q * L/A. Note that the area is A = H*W. So, the full equation is R = q * L/ (H*W). I believe the parameter you want is H, the height of metal layer.

The sheet resistance in the file is measured in ohms/square. This corresponds to the assumption that the length L and with W are equal. So, making the assumption that L=W and putting that into the resistance equation, we get Rsq = q / H. So, rearrange the equation and we get that H = q / Rsq. In words, the metal height is equal to the metal resistivity divided by the resistance per square.

So, for layer M3, the highest metal layer, we have q = 0.0282 ohm/sq and Rsq = 0.05 ohm/um^2. With the equation we get H = 0.56um.
 
THank you ! One more question. Do you know where can I find the value of the thickness of the oxide layer (SiO2) in the technology AMI 0.5 um with a lambda of 0.3 um ?

regards !

Joaquin
 

Here's a general compilation of metal thicknesses for several process nodes:

View attachment 99421

Note that for process sizes ≧ 0.35µm upper and lower metal layers used to have the same thickness.

This is a very strange table - lower metals thicker and wider then upper metals?!

Are they turning the chip upside down? :)
 

This is a very strange table - lower metals thicker and wider then upper metals?!

Are they turning the chip upside down? :)

Well observed, Max! I guess they simply mixed up lower & upper ;-)

- - - Updated - - -

... where can I find the value of the thickness of the oxide layer (SiO2) in the technology AMI 0.5 um with a lambda of 0.3 um ?

Gate Oxide Thickness is given directly in the MOSIS AMI 0.5µm Test report, linked above.

Field Oxide and Intermetal Layer thicknesses you can calculate from the given CAPACITANCE PARAMETERS.
 

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