Welcome to our site! EDAboard.com is an international Electronics Discussion Forum focused on EDA software, circuits, schematics, books, theory, papers, asic, pld, 8051, DSP, Network, RF, Analog Design, PCB, Service Manuals... and a whole lot more! To participate you need to register. Registration is free. Click here to register now.
Is there any functional difference in the dummy poly we use in deep sub micron technologies and micron technologies.
I learned that , dummy poly is used to protect the gate while etching....
Is it the same etching mechanism that we are following even for the lower nodes?
This site uses cookies to help personalise content, tailor your experience and to keep you logged in if you register.
By continuing to use this site, you are consenting to our use of cookies.