Is implant layer fabricated or it is just rerecognition laye

purpose of implant layer

Hello all,

Is the implant layer is actually fabricated or it is just recognition layer.....
what is the use of this layer if it is fabricated......???


thx in advance.....

inplant layer

The implant layer is a physical masking layer that is imaged onto the wafer by photoresist. The wafer is then subject to implantation to change the silicon into N or P doped. Where the resist is in place, the implanted ions are trapped in the resist and never reach the silicon.
At the end of the process, the photoresist etch dissolved away and no trace is left of it - so you cannot see any evidence of these layers if looking at an IC.

An simple example is the nmos and pmos transistors in an invertor.
First the N+ source drain image is placed on the wafer. It covers all PMOS areas and exposes all NMOS areas. The N type dopant is implanted into the nmos transistors then the resist image removed. The the P+ source drain image is placed on the wafer covering the NMOS areas and exposing the PMOS areas and the wafer is implanted with P dopant before removing the resist. The wafer is then annealed at high temperature to electrically activate the N and P dopants

implant layer fabrication

does it means that this layer is only used for defining the area of p or n diffusion..???

and no implant layer is actually present after fabrication??

implant layer.. ..

No, after implantation the actual affect is there but it don't have any physical projection to see or touch.

implant layer.. ..

thaks a lot calbaidh and mfarooq.....