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Probably because they're barely capable of printing straight
rectangles at that node and don't need more challenges. The
fancy mask making algorithms may not have been worked out
or qualified.
Anisotropic process steps cause assymetries in process. The mismatches caused by this effect can be avoided by maintianing same orientation such that the current flow will be strictly in one direction.
And poly orientation issue might come under DFM issue too.. the stress effect will be different for different orientations. One might effect the other.
even I'm a newbee to 28nm though. just sharing my thoughts.
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